LOW-LYING ELECTRONIC STATES OF SIF3 RADICAL

被引：8

作者：

SO, SP ^{[1
]}

机构：

[1] CHINESE UNIV HONG KONG,CHUNG CHI COLL,DEPT CHEM,SHATIN,HONG KONG

来源：

JOURNAL OF MOLECULAR STRUCTURE | 1977年 / 39卷 / 01期

关键词：

D O I：

10.1016/0022-2860(77)85042-4

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：133 / 137

页数：5

共 23 条

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