KINETICS OF SICL4 OXIDATION

[1] AUDSLEY A, 1969, J APPL CHEM, V19, P33

[2] DIARMID A, 1968, ORGANOMETALLIC COM 1, V1, P46

[3] DUMBAUGH WH, 1969, ENCYCLOPEDIA CHEM TE, V18, P73

[4] FRENCH WG, 1977, 1977 P INT C INT OPT, P379

[5] FRITZ JS, 1969, QUANTITATIVE ANAL CH, P278

[6] Keck D. B., 1973, U.S. Patent, Patent No. [3,711,262, 3711262]

[7] MACCHESNEY JB, 1974, 10TH INT C GLASS 1

[8] SCHULTZ PC, 1973, AM CERAM SOC BULL, V52, P383

[9] TANAKA J, 1973, YOGYO-KYOKAI-SHI, V81, P179

[10] VAPOR-PHASE PRODUCTION OF COLLOIDAL SILICA [J]. INDUSTRIAL AND ENGINEERING CHEMISTRY, 1959, 51 (03): : 232 - 238

[1] AUDSLEY A, 1969, J APPL CHEM, V19, P33

[2] DIARMID A, 1968, ORGANOMETALLIC COM 1, V1, P46

[3] DUMBAUGH WH, 1969, ENCYCLOPEDIA CHEM TE, V18, P73

[4] FRENCH WG, 1977, 1977 P INT C INT OPT, P379

[5] FRITZ JS, 1969, QUANTITATIVE ANAL CH, P278

[6] Keck D. B., 1973, U.S. Patent, Patent No. [3,711,262, 3711262]

[7] MACCHESNEY JB, 1974, 10TH INT C GLASS 1

[8] SCHULTZ PC, 1973, AM CERAM SOC BULL, V52, P383

[9] TANAKA J, 1973, YOGYO-KYOKAI-SHI, V81, P179

[10] VAPOR-PHASE PRODUCTION OF COLLOIDAL SILICA [J]. INDUSTRIAL AND ENGINEERING CHEMISTRY, 1959, 51 (03): : 232 - 238