SURFACE PHOTOCHEMISTRY OF CH3CL - DISSOCIATIVE ELECTRON-ATTACHMENT THROUGH D2O SPACER LAYERS

被引：13

作者：

JO, SK ^{[1
]}

WHITE, JM ^{[1
]}

机构：

[1] UNIV TEXAS,CTR MAT CHEM,AUSTIN,TX 78712

来源：

SURFACE SCIENCE | 1991年 / 255卷 / 03期

基金：

美国国家科学基金会;

关键词：

D O I：

10.1016/0039-6028(91)90689-P

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The rates of photo-induced dissociation of chloromethane, CH3Cl, on D2O-precovered Pt(111) at 55 K were correlated with the measured yields of substrate-excited photoelectrons, for a variety of D2O-precoverages. An excellent quantitative correlation was obtained, consistent with the expected dissociative electron attachment (DEA) mechanism for the C-Cl bond cleavage. Measured electron energy distributions suggest that very low energy (< 0.4 eV) electrons are most effective for CH3Cl dissociation.

引用

页码：321 / 326

页数：6

共 10 条

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