EFFECT OF INTERNAL OXIDATION PRETREATMENTS AND SI CONTAMINATION ON OXIDE-SCALE GROWTH AND SPALLING

被引:25
作者
HOU, PY [1 ]
STRINGER, J [1 ]
机构
[1] ELECT POWER RES INST,PALO ALTO,CA 94304
来源
OXIDATION OF METALS | 1990年 / 33卷 / 5-6期
关键词
Cr[!sub]2[!/sub]O[!sub]3[!/sub; reactive-element effect; internal oxidation; silicon;
D O I
10.1007/BF00666805
中图分类号
TF [冶金工业];
学科分类号
0806 ;
摘要
Internal oxidation pretreatments carried out in quartz capsule with a Rhines pack were found to have a profound effect on the subsequent oxidation behavior of alloys. Specimens of Co-15 wt.% Cr, Co-25 wt.% Cr, Ni-25 wt.% Cr, and Ni-25 wt.% Cr-1 wt.% Al were tested at 1100°C after pre-oxidation treatments. Even without the development of internal oxide particles, pretreated binary CoCr and NiCr alloys oxidized with significantly lower rates. Selective oxidation of chromium was observed on the non-Cr2O3-forming Co-base alloys, whereas on the Cr2O3-forming Ni-base alloys, elimination of base-metal oxide, reduction in the Cr2O3 growth rate, and better scale adhesion were found. These effects were more apparent with pre-oxidation temperatures greater than 1000°C and with longer pretreatment times. Contaimination of Si from the quartz is believed to be the cause. © 1990 Plenum Publishing Corporation.
引用
收藏
页码:357 / 369
页数:13
相关论文
共 16 条