CHARACTERISTICS OF ANNEALING KINETICS OF TIN FILMS DEPOSITED AT 88 DEGREES K

被引:7
作者
PRIEST, J
CHIOU, C
CASWELL, HL
机构
关键词
D O I
10.1063/1.1728434
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:1772 / &
相关论文
共 17 条
[1]  
BARTLETT, 1953, PHYSIC REV, V89, P848
[2]   EINFLUSS DER KONDENSATION BEI TIEFEN TEMPERATUREN AUF DEN ELEKTRISCHEN WIDERSTAND UND DIE SUPRALEITUNG FUR VERSCHIEDENE METALLE [J].
BUCKEL, W ;
HILSCH, R .
ZEITSCHRIFT FUR PHYSIK, 1954, 138 (02) :109-120
[3]  
Buckel W., 1952, Z PHYS, V132, P420
[4]   EFFECT OF RESIDUAL GASES ON SUPERCONDUCTING CHARACTERISTICS OF TIN FILMS [J].
CASWELL, HL .
JOURNAL OF APPLIED PHYSICS, 1961, 32 (01) :105-&
[7]  
EVANS CC, 1959, STRUCTURE PROPERTIES, P263
[8]   MOBILITY OF INTERSTITIAL ATOMS IN A FACE-CENTERED METAL [J].
HUNTINGTON, HB .
PHYSICAL REVIEW, 1953, 91 (05) :1092-1098
[9]   Mechanism for self-diffusion in metallic copper [J].
Huntington, HB ;
Seitz, F .
PHYSICAL REVIEW, 1942, 61 (5/6) :315-325
[10]  
LOMER WM, 1955, PHILOS MAG, V46, P711