AN ELLIPSOMETRIC STUDY OF SURFACE FILMS ON COPPER ELECTRODES UNDERGOING ELECTROPOLISHING

被引：33

作者：

NOVAK, M

REDDY, AKN

WROBLOWA, H

机构：

来源：

关键词：

D O I：

10.1149/1.2407619

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：733 / &

共 25 条

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