DEVELOPMENT OF AN IONIZED CLUSTER BEAM SYSTEM FOR LARGE-AREA DEPOSITION

被引:3
作者
INA, T [1 ]
MINOWA, Y [1 ]
KOSHIRAKAWA, N [1 ]
YAMANISHI, K [1 ]
机构
[1] MITSUBISHI ELECT CORP,PROD DEV LAB,AMAGASAKI,HYOGO 661,JAPAN
关键词
D O I
10.1016/0168-583X(89)90297-8
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
引用
收藏
页码:779 / 782
页数:4
相关论文
共 5 条
[1]  
ASANO M, 1987, 11TH P S ISIAT 87 TO, P337
[2]  
HANAI M, 1987, 11TH P S ISIAT87 TOK, P387
[3]  
INA T, 1985, 5TH P INT C ION PLAS, P16
[4]   SIO2-FILMS DEPOSITED ON SI BY AN IONIZED CLUSTER BEAM [J].
MINOWA, Y ;
YAMANISHI, K ;
TSUKAMOTO, K .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (04) :1148-1151
[5]  
TAKAGI T, 1981, THIN SOLID FILMS, V80, P105