EFFECT OF HYDROGENATION AND THERMAL ANNEALING ON THE PHOTOLUMINESCENCE OF P-INP

被引:4
作者
BALASUBRAMANIAN, S
RAO, KSRK
BALASUBRAMANIAN, N
KUMAR, V
机构
[1] INDIAN TELEPHONE IND,MICROELECTR LAB,BANGALORE 560016,KARNATAKA,INDIA
[2] SOLID STATE PHYS LAB,DELHI 110054,INDIA
关键词
D O I
10.1063/1.359230
中图分类号
O59 [应用物理学];
学科分类号
摘要
The effect of hydrogenation and thermal annealing on the photoluminescence (PL) of InP:Mg and InP:Zn is presented. On hydrogenation, a rise in near-band-edge PL intensity by a factor of 16 for the InP:Mg sample and a factor of 50 for the InP:Zn sample is observed and this is attributed to the passivation of nonradiative centers. A donor-acceptor pair transition before hydrogenation in the InP:Mg sample and after hydrogenation in the InP:Zn sample was observed. In both cases, the magnitude of the shift in peak position with excitation intensity shows the involvement of a donor deeper than the normally present shallow donors. The ionization energy of the donor in InP:Mg is estimated to be 48 meV and that in InP:Zn is estimated to be <40 meV. No hydrogenation induced radiative transitions were observed. In the InP:Mg samples, the acceptor passivation effects are lost after annealing at a temperature of 350°C for 2 min, whereas the nonradiative center passivation after hydrogenation is not completely lost. In InP:Zn, the acceptor passivation along with nonradiative and deep center passivation are lost after an annealing treatment of 300°C for 2 min. A thermally induced D-A pair emission in InP:Zn which moves to lower energies with increasing annealing temperature is observed. Such a transition is not observed for InP:Mg. This can be either due to a preferential pairing of the donor and acceptor which becomes randomized after the heat treatment or due to the removal of hydrogenation effects by annealing. © 1995 American Institute of Physics.
引用
收藏
页码:5398 / 5405
页数:8
相关论文
共 37 条
[1]   REVERSE-BIAS ANNEALING KINETICS OF MG-H COMPLEXES IN INP [J].
BALASUBRAMANIAN, S ;
KUMAR, V ;
BALASUBRAMANIAN, N .
JOURNAL OF APPLIED PHYSICS, 1993, 74 (07) :4521-4526
[2]   REDUCED PHOSPHORUS LOSS FROM INP SURFACE DURING HYDROGEN PLASMA TREATMENT [J].
BALASUBRAMANIAN, S ;
KUMAR, V ;
BALASUBRAMANIAN, N .
APPLIED PHYSICS LETTERS, 1994, 64 (13) :1696-1698
[3]   RESISTANCE SWITCHING IN INDIUM-PHOSPHIDE USING HYDROGEN PASSIVATION OF ACCEPTORS [J].
BALASUBRAMANIAN, S ;
KUMAR, V ;
BALASUBRAMANIAN, N ;
PREMACHANDRAN, V .
APPLIED PHYSICS LETTERS, 1994, 64 (17) :2256-2257
[4]   THERMAL-DEGRADATION OF INP IN OPEN TUBE PROCESSING - DEEP-LEVEL PHOTOLUMINESCENCE [J].
BANERJEE, S ;
SRIVASTAVA, AK ;
ARORA, BM .
JOURNAL OF APPLIED PHYSICS, 1990, 68 (05) :2324-2330
[5]   OPTICAL-PROPERTIES OF IN1-XGAXP1-YASY, INP, GAAS, AND GAP DETERMINED BY ELLIPSOMETRY [J].
BURKHARD, H ;
DINGES, HW ;
KUPHAL, E .
JOURNAL OF APPLIED PHYSICS, 1982, 53 (01) :655-662
[6]   AN INVESTIGATION OF MAGNESIUM IN INDIUM-PHOSPHIDE GROWN BY MOLECULAR-BEAM EPITAXY [J].
CHENG, TS ;
AIRAKSINEN, VM ;
STANLEY, CR .
JOURNAL OF APPLIED PHYSICS, 1988, 64 (12) :6662-6667
[7]   HYDROGEN PASSIVATION OF SHALLOW ACCEPTORS IN P-TYPE INP [J].
CHEVALLIER, J ;
JALIL, A ;
THEYS, B ;
PESANT, JC ;
AUCOUTURIER, M ;
ROSE, B ;
MIRCEA, A .
SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1989, 4 (02) :87-90
[8]   EFFECT OF COOLING AMBIENT ON ELECTRICAL ACTIVATION OF DOPANTS IN MOVPE OF INP [J].
COLE, S ;
EVANS, JS ;
HARLOW, MJ ;
NELSON, AW ;
WONG, S .
ELECTRONICS LETTERS, 1988, 24 (15) :929-931
[9]   FABRICATION OF A NEW TYPE OF FIELD-EFFECT TRANSISTOR USING NEUTRALIZATION OF SHALLOW DONORS BY ATOMIC-HYDROGEN IN NORMAL-GAAS (SI) [J].
CONSTANT, E ;
CAGLIO, N ;
CHEVALLIER, J ;
PESANT, JC .
ELECTRONICS LETTERS, 1987, 23 (16) :841-843
[10]   PASSIVATION OF DEEP LEVEL DEFECTS IN MOLECULAR-BEAM EPITAXIAL GAAS BY HYDROGEN PLASMA EXPOSURE [J].
DAUTREMONTSMITH, WC ;
NABITY, JC ;
SWAMINATHAN, V ;
STAVOLA, M ;
CHEVALLIER, J ;
TU, CW ;
PEARTON, SJ .
APPLIED PHYSICS LETTERS, 1986, 49 (17) :1098-1100