Thin films of Sr2AlTaO6 (SAT) and multilayers of YBa2Cu3O7 (YBCO)/SAT have been grown by pulsed laser deposition on [001] LaAlO3 substrates. X-ray diffraction shows that SAT grows on [001] LaAlO3 with the c-axis oriented normal to the substrate plane. X-ray rocking curve and Rutherford backscattering channeling measurements on SAT films yield full width at half maximum of < 0.3-degrees and minimum backscattering yield chi(min) of 5%-7%, respectively, indicating good crystallinity. The real part of the dielectric constant epsilon(r), is found to be approximately 23-30, with approximately 6 X 10(7) V/m static breakdown electric field. Both the dielectric constant and the static breakdown field show negligible temperature dependence between 10 and 300 K. A 100 nm X 10 mum X 50 mum YBCO film on SAT shows zero-field critical current density of approximately 1.3 X 10(6) A/CM2 at 77 K, with a superconducting transition temperature T(c0) of approximately 89.2 K.
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Stanford Univ, Dept Appl Phys, Stanford, CA 94305 USA
Xerox Palo Alto Res Ctr, Palo Alto, CA USAStanford Univ, Dept Appl Phys, Stanford, CA 94305 USA
Fork, David K.
Fenner, David B.
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Xerox Palo Alto Res Ctr, Palo Alto, CA USA
Santa Clara Univ, Dept Phys, Santa Clara, CA 95053 USAStanford Univ, Dept Appl Phys, Stanford, CA 94305 USA
Fenner, David B.
Barrera, Adrian
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Stanford Univ, Dept Appl Phys, Stanford, CA 94305 USAStanford Univ, Dept Appl Phys, Stanford, CA 94305 USA
Barrera, Adrian
Phillips, Julia M.
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AT&T Bell Labs, Murray Hill, NJ 07974 USAStanford Univ, Dept Appl Phys, Stanford, CA 94305 USA
Phillips, Julia M.
Geballe, Theodore H.
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Stanford Univ, Dept Appl Phys, Stanford, CA 94305 USAStanford Univ, Dept Appl Phys, Stanford, CA 94305 USA
Geballe, Theodore H.
Connell, G. A. N.
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Xerox Palo Alto Res Ctr, Palo Alto, CA USAStanford Univ, Dept Appl Phys, Stanford, CA 94305 USA
Connell, G. A. N.
Boyce, James B.
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Xerox Palo Alto Res Ctr, Palo Alto, CA USAStanford Univ, Dept Appl Phys, Stanford, CA 94305 USA
机构:
Stanford Univ, Dept Appl Phys, Stanford, CA 94305 USA
Xerox Palo Alto Res Ctr, Palo Alto, CA USAStanford Univ, Dept Appl Phys, Stanford, CA 94305 USA
Fork, David K.
Fenner, David B.
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机构:
Xerox Palo Alto Res Ctr, Palo Alto, CA USA
Santa Clara Univ, Dept Phys, Santa Clara, CA 95053 USAStanford Univ, Dept Appl Phys, Stanford, CA 94305 USA
Fenner, David B.
Barrera, Adrian
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Stanford Univ, Dept Appl Phys, Stanford, CA 94305 USAStanford Univ, Dept Appl Phys, Stanford, CA 94305 USA
Barrera, Adrian
Phillips, Julia M.
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AT&T Bell Labs, Murray Hill, NJ 07974 USAStanford Univ, Dept Appl Phys, Stanford, CA 94305 USA
Phillips, Julia M.
Geballe, Theodore H.
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机构:
Stanford Univ, Dept Appl Phys, Stanford, CA 94305 USAStanford Univ, Dept Appl Phys, Stanford, CA 94305 USA
Geballe, Theodore H.
Connell, G. A. N.
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h-index: 0
机构:
Xerox Palo Alto Res Ctr, Palo Alto, CA USAStanford Univ, Dept Appl Phys, Stanford, CA 94305 USA
Connell, G. A. N.
Boyce, James B.
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Xerox Palo Alto Res Ctr, Palo Alto, CA USAStanford Univ, Dept Appl Phys, Stanford, CA 94305 USA