RATE OF ELECTROLESS COPPER DEPOSITION BY FORMALDEHYDE REDUCTION

被引：49

作者：

DUMESIC, J ^{[1
]}

KOUTSKY, JA ^{[1
]}

CHAPMAN, TW ^{[1
]}

机构：

[1] UNIV WISCONSIN, DEPT CHEM ENGN, MADISON, WI 53706 USA

来源：

关键词：

D O I：

10.1149/1.2401698

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1405 / 1412

页数：8

共 43 条

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