DEEP SUB-mu m LOW-Tc JOSEPHSON TECHNOLOGY: THE OPPORTUNITIES AND THE CHALLENGES

Through the 1980s and into the 1990s the semiconductor industry has driven the limits of practical device fabrication into the deep sub-pm regime. Duriig that same time period most work in Josephson technology has been at or above the 1-2 mu m level. There now exists the possibility of highly leveraging existing semiconductor technolo y to explore sub-mu m Jose hson technology. Some of the o portunities and chalrenges of such an undertaking will be discussed in the context of SQUIDs and digital applications.