ROLE OF SURFACE HYDROXYLS IN NUCLEATION OF SPUTTERED TANTALUM FILMS

被引:7
作者
FEINSTEIN, LG
HUTTEMANN, RD
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D O I
10.1016/0040-6090(72)90118-6
中图分类号
T [工业技术];
学科分类号
08 ;
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页码:S47 / +
页数:1
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[4]  
ORR WH, 1970, PROC ELECTRON COMPON, P602
[5]   A NEW STRUCTURE IN TANTALUM THIN FILMS (VAPOR DEPOSITION SUPERCONDUCTIVITY SPUTTERING X-RAY DIFFRACTION E) [J].
READ, MH ;
ALTMAN, C .
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