SOME EFFECTS OF STRESS IN GOSS-ORIENTED SILICON-IRON

被引:16
作者
MOSES, AJ
PHILLIPS, PS
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D O I
10.1109/TMAG.1978.1059884
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
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页码:353 / 355
页数:3
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共 4 条
[1]   DYNAMIC MAGNETOSTRICTION AND MECHANICAL STRAIN IN ORIENTED 3 PER CENT SILICON-IRON SHEET SUBJECT TO COMBINED LONGITUDINAL AND TRANSVERSE STRESSES [J].
BANKS, PJ ;
RAWLINSON, E .
PROCEEDINGS OF THE INSTITUTION OF ELECTRICAL ENGINEERS-LONDON, 1967, 114 (10) :1537-+
[2]   INFLUENCE OF STRESS ON ROTATIONAL LOSS IN SILICON-IRON [J].
BASAK, A ;
MOSES, AJ .
PROCEEDINGS OF THE INSTITUTION OF ELECTRICAL ENGINEERS-LONDON, 1978, 125 (02) :165-168
[3]   EFFECT OF STRESS ON DOMAIN STRUCTURE OF GOSS TEXTURED SILICON-IRON [J].
CORNER, WD ;
MASON, JJ .
BRITISH JOURNAL OF APPLIED PHYSICS, 1964, 15 (06) :709-&
[4]   EFFECTS OF STRESSES ON MAGNETIC-PROPERTIES OF SILICON-IRON LAMINATIONS [J].
MOSES, AJ .
JOURNAL OF MATERIALS SCIENCE, 1974, 9 (02) :217-222