PREPARATION OF ZRO2 ON FLAT, CONDUCTING SIO2/SI(100) MODEL SUPPORTS BY WET CHEMICAL TECHNIQUES - X-RAY PHOTOELECTRON-SPECTROSCOPY AND AUGER DEPTH PROFILING

被引:27
作者
ESHELMAN, LM [1 ]
DEJONG, AM [1 ]
NIEMANTSVERDRIET, JW [1 ]
机构
[1] EINDHOVEN UNIV TECHNOL,SCHUIT INST CATALYSIS,5600 MB EINDHOVEN,NETHERLANDS
关键词
ZRO2/SIO2; MODEL CATALYSTS; CATALYST PREPARATION; SURFACE CHARACTERIZATION; XPS; AUGER DEPTH PROFILING;
D O I
10.1007/BF00772072
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Model supports consisting of a thin layer of SiO2 on a silicon single crystal have been used to study ZrO2/SiO2/Si model catalysts made by wet chemical preparation methods. Auger depth profiling and angle-dependent X-ray photoelectron spectroscopy show that catalysts prepared by a surface reaction between zirconium ethoxide and hydroxyl groups on the SiO2 contain a highly dispersed zirconium phase that is converted to ZrO2 upon calcination.
引用
收藏
页码:201 / 209
页数:9
相关论文
共 11 条