RESIDUAL ABSORPTION IN IR MATERIALS/RIALS

被引:23
作者
HASS, M
BENDOW, B
机构
[1] USN,RES LAB,WASHINGTON,DC 20375
[2] USAF,DIV SOLID STATE SCI,DEPUTY ELECTR TECHNOL RADC,HANSCOM AFB,MA 01731
来源
APPLIED OPTICS | 1977年 / 16卷 / 11期
关键词
D O I
10.1364/AO.16.002882
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
引用
收藏
页码:2882 / 2890
页数:9
相关论文
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