STRUCTURE OF SILICON FILMS DEPOSITED ON OXIDIZED SILICON WAFERS

[1] ALEXANDER EG, 1966, T METALL SOC AIME, V236, P284

[2] Bean K. E., 1969, Semiconductor silicon, P747

[3] COLLINS FM, 1961, 8 T NATL VAC S, V2, P899

[4] KATOOKA Y, 1962, J PHYS SOC JAPAN, V17, P967

[5] KNOPP AN, 1967, ELECTROCHEM TECHNOL, V5, P37

[6] TEXTURAL CHARACTERISTICS AND ELECTRICAL PROPERTIES OF VACUUM EVAPORATED SILICON FILMS [J]. VACUUM, 1965, 15 (07) : 359 - &

[7] PAVLOV PV, 1967, SOV PHYS CRYSTALLOGR, V12, P95

[1] ALEXANDER EG, 1966, T METALL SOC AIME, V236, P284

[2] Bean K. E., 1969, Semiconductor silicon, P747

[3] COLLINS FM, 1961, 8 T NATL VAC S, V2, P899

[4] KATOOKA Y, 1962, J PHYS SOC JAPAN, V17, P967

[5] KNOPP AN, 1967, ELECTROCHEM TECHNOL, V5, P37

[6] TEXTURAL CHARACTERISTICS AND ELECTRICAL PROPERTIES OF VACUUM EVAPORATED SILICON FILMS [J]. VACUUM, 1965, 15 (07) : 359 - &

[7] PAVLOV PV, 1967, SOV PHYS CRYSTALLOGR, V12, P95