LIMITING RATE OF DEPOSITION BY P-R PLATING

[1] ELECTRODEPOSITION OF GOLD BY PULSED CURRENT [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1971, 118 (04) : 551 - &

[2] HICKLING A, 1957, T I MET FINISH, V34, P199

[3] JERNSTEDT GW, 1950, ANN P AM ELECTROPLAT, V37, P151

[4] JERNSTEDT GW, 1949, ANN P AM ELECTROPLAT, V36, P63

[5] Mathematical theory of the changes of concentration at the electrode, brought about by diffusion and by chemical reaction [J]. JOURNAL OF PHYSICAL CHEMISTRY, 1910, 14 (09) : 816 - 884

[1] ELECTRODEPOSITION OF GOLD BY PULSED CURRENT [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1971, 118 (04) : 551 - &

[2] HICKLING A, 1957, T I MET FINISH, V34, P199

[3] JERNSTEDT GW, 1950, ANN P AM ELECTROPLAT, V37, P151

[4] JERNSTEDT GW, 1949, ANN P AM ELECTROPLAT, V36, P63

[5] Mathematical theory of the changes of concentration at the electrode, brought about by diffusion and by chemical reaction [J]. JOURNAL OF PHYSICAL CHEMISTRY, 1910, 14 (09) : 816 - 884