IRREVERSIBLE DEPOSITION ON DISORDERED SUBSTRATES

We report results of a Monte Carlo study of the kinetics of random sequential deposition of line segments (mostly dimers) on the 1D lattice substrate, already occupied with point-like quenched impurities at low concentration. The area covered by the placed objects grows with time and finally reaches a jamming limit when no more deposition is possible. The jamming coverage values, obtained by numerical simulations, depend on the segment length and on the previous occupation of the substrate by impurities, The rate of late-stage deposition is not disturbed by presence of forbidden sites when the process of deposition starts (t=0). Numerical results, shown in semi-log scale, confirm that area coverage theta(t) approaches the jamming limit theta(infinity) exponentially, with the same exponent factor - 1 multiplying scaled time, as in the case of random sequential deposition of line segments on the clean 1D lattice (initially non-occupied).