EFFECT OF SURFACE SEGREGATION OF MG ON CONTACT RESISTANCE OF AL-0.5-PERCENT MG

被引：5

作者：

BRAUNOVIC, M

POMATHIOD, L

BAILON, JP

机构：

[1] HYDRO QUEBEC INST RES,VARENNES,QUEBEC,CANADA

[2] ECOLE POLYTECH,DEPT GENIE MET,MONTREAL H3C 3A7,QUEBEC,CANADA

来源：

IEEE TRANSACTIONS ON PARTS HYBRIDS AND PACKAGING | 1977年 / 13卷 / 01期

关键词：

D O I：

10.1109/TPHP.1977.1135176

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：31 / 35

页数：5

共 12 条

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[5] MESSUNG DES WIDERSTANDES DUNNER ISOLIERENDER SCHICHTEN ZWISCHEN GOLDKONTAKTEN IM BEREICH DES TUNNELEFFEKTES [J].

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[6] TEMPERATURE-DEPENDENCE OF THICKNESS OF SURFACE OXIDE ON ALUMINUM [J].

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[7] AUGER ELECTRON SPECTROSCOPY AND LEED STUDY OF EQUILIBRIUM SURFACE SEGREGATION IN COPPER-ALUMINUM ALLOYS [J].

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[8]

HAQUE CA, 1971, ELECTRICAL CONTACT 2

[9]

HOLM R, 1967, ELECTRIC CONTACTS

[10]

JORGENSON PJ, 1967, J AM CER SOC, V50, P353

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