CHANNELING STUDY OF EPITAXIAL AL AND AG FILMS ON SI(111) SUBSTRATES

被引:4
作者
JIN, HS
PARK, KH
YAPSIR, AS
WANG, GC
LU, TM
LUO, L
GIBSON, WM
YAMADA, I
TAKAGI, T
机构
[1] RENSSELAER POLYTECH INST,DEPT PHYS,TROY,NY 12180
[2] SUNY ALBANY,DEPT PHYS,ALBANY,NY 12222
[3] KYOTO UNIV,ION BEAM ENGN EXPTL LAB,KYOTO 606,JAPAN
关键词
D O I
10.1016/0168-583X(89)90485-0
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
引用
收藏
页码:817 / 822
页数:6
相关论文
共 15 条
[1]  
APPLETON BR, 1977, ION BEAM HDB MATERIA, P67
[2]  
Chu Wei-Kan, 1978, BACKSCATTERING SPECT, P54
[3]  
FELDMAN LC, 1982, MATERIALS ANAL ION C
[4]  
Ignat'ev A. S., 1982, Soviet Technical Physics Letters, V8, P174
[5]  
JIN HS, 1987, APPL PHYS LETT, V50, P162
[6]  
LeGoues F.K., 1987, MATER RES SOC S P, V94, P121
[7]   ATOMIC-STRUCTURE OF THE EPITAXIAL AL-SI INTERFACE [J].
LEGOUES, FK ;
KRAKOW, W ;
HO, PS .
PHILOSOPHICAL MAGAZINE A-PHYSICS OF CONDENSED MATTER STRUCTURE DEFECTS AND MECHANICAL PROPERTIES, 1986, 53 (06) :833-841
[8]  
LEGOUES FK, 1985, LAYERED STRUCTURES E, V37, P395
[9]  
LEGOUES FK, 1986, PHILOS MAG A, V53, P883
[10]  
PARK KH, 1988, MATER RES SOC S P, V102, P271