THE FORMATION MECHANISMS OF OXYGEN-DEFICIENT DEFECTS IN SYNTHETIC SILICA GLASSES

被引：19

作者：

HAYASHI, S

AWAZU, K

KAWAZOE, H

机构：

[1] ELECTROTECH LAB,TSUKUBA,IBARAKI 305,JAPAN

[2] TOKYO INST TECHNOL,ENGN MAT RES LAB,MIDORI KU,YOKOHAMA,KANAGAWA 227,JAPAN

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 1994年 / 179卷

关键词：

D O I：

10.1016/0022-3093(94)90701-3

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The formation mechanisms of oxygen-deficient defects in synthetic silica glass sintered under vacuum were studied. 7.6 and 5.0 eV optical absorption bands in the glasses were measured with synchrotron-orbital-radiation light, and photoluminescence excited by a KrF excimer laser also was measured. It is concluded that these 7.6 eV absorption defects are generated by elimination of chlorine in the vapor-phase axial deposition soot body, and that the 7.6 and 5.0 eV absorption bands exist with a constant ratio.

引用

页码：235 / 242

页数：8

共 20 条

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