THE GROWTH OF ELECTRODEPOSITS

被引：15

作者：

KEEN, JM

FARR, JPG

机构：

来源：

关键词：

D O I：

10.1149/1.2425527

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：668 / 678

页数：11

共 16 条

[1]

Barnes S.C., 1960, ELECTROCHIM ACTA, V2, P195, DOI [10.1016/0013-4686(60)87018-1, DOI 10.1016/0013-4686(60)87018-1]

[2]

BARRETT CS, 1952, STRUCTURE METALS, P185

[3]

BASSETT GA, 1959, DISCUSSIONS FARADAY, V28, P1

[4]

CAVALLARO L, 1955, REV MET, V52, P706

[5] THE MECHANISM OF ELECTROLYTIC METAL DEPOSITION [J].

CONWAY, BE ;

BOCKRIS, JO .

PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL AND PHYSICAL SCIENCES, 1958, 248 (1254) :394-403

[6]

Frank F.C., 1958, GROWTH PERFECTION CR, P6

[7] THE DOUBLE LAYER IN ELECTROCHEMISTRY [J].

FRUMKIN, AN .

[8]

Greninger AB, 1935, T AM I MIN MET ENG, V117, P61

HOWES, VR .

PROCEEDINGS OF THE PHYSICAL SOCIETY OF LONDON, 1959, 74 (479) :616-624

[10]

Pick H. J., 1960, ELECTROCHIM ACTA, V2, P165, DOI 10.1016/0013-4686(60)87014-4