EFFECT OF ANODE SURFACE ON GROWTH OF SILICON-OXIDE NEEDLES INDUCED BY POSITIVE CORONA DISCHARGE

被引：14

作者：

NASHIMOTO, K ^{[1
]}

机构：

[1] FUJI XEROX CO LTD, XEROGRAPH TECHNOL RES LAB, EBINA, KANAGAWA 24304, JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1988年 / 27卷 / 07期

关键词：

D O I：

10.1143/JJAP.27.L1181

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：L1181 / L1183

页数：3

共 10 条

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JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1987, 26 (07) :L1138-L1140

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[5]

NEUMANN GM, 1980, J PHYS D APPL PHYS, V13, P485, DOI 10.1088/0022-3727/13/3/022

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FUJIMOTO, Y .

[8]

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[9]

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[10]

1982, KINZOKUBINRAN, P348