EXPERIMENTAL TEST OF THE TRANSITION LAYER MODEL OF ATOMIC LAYER EPITAXY

被引:13
作者
JUZA, P
SITTER, H
HERMAN, MA
机构
关键词
D O I
10.1063/1.99988
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:1396 / 1398
页数:3
相关论文
共 16 条
[1]   GAAS SUBSTRATE PREPARATION FOR OVAL-DEFECT ELIMINATION DURING MBE GROWTH [J].
FRONIUS, H ;
FISCHER, A ;
PLOOG, K .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1986, 25 (02) :L137-L138
[2]   ATOMIC LAYER EPITAXY [J].
GOODMAN, CHL ;
PESSA, MV .
JOURNAL OF APPLIED PHYSICS, 1986, 60 (03) :R65-R81
[3]   GROWTH-MECHANISM IN ATOMIC LAYER EPITAXY .1. RE-EVAPORATION OF CD AND TE FROM CDTE(111) SURFACES MONITORED BY AUGER-ELECTRON SPECTROSCOPY [J].
HERMAN, MA ;
JYLHA, O ;
PESSA, M .
CRYSTAL RESEARCH AND TECHNOLOGY, 1986, 21 (07) :841-851
[4]   SURFACE-MORPHOLOGY OF CDTE-FILMS GROWN ON CDTE (111) SUBSTRATES BY ATOMIC LAYER EPITAXY [J].
HERMAN, MA ;
VULLI, M ;
PESSA, M .
JOURNAL OF CRYSTAL GROWTH, 1985, 73 (02) :403-406
[5]   GROWTH-MECHANISM IN ATOMIC LAYER EPITAXY .3. REEVAPORATION OF CD AND TE FROM CDTE(111) SURFACES AND THICK ELEMENTAL DEPOSITS MONITORED BY QUADRUPOLE-MASS SPECTROMETRY [J].
HERMAN, MA ;
JUZA, P ;
FASCHINGER, W ;
SITTER, H .
CRYSTAL RESEARCH AND TECHNOLOGY, 1988, 23 (03) :307-317
[6]   GROWTH-MECHANISM IN ATOMIC LAYER EPITAXY .2. A MODEL OF THE GROWTH-PROCESS OF CDTE ON CDTE(111) SUBSTRATES [J].
HERMAN, MA ;
JYLHA, O ;
PESSA, M .
CRYSTAL RESEARCH AND TECHNOLOGY, 1986, 21 (08) :969-974
[7]   ATOMIC LAYER EPITAXY OF CD1-XMNXTE GROWN ON CDTE (111)B SUBSTRATES [J].
HERMAN, MA ;
JYLHA, O ;
PESSA, M .
JOURNAL OF CRYSTAL GROWTH, 1984, 66 (02) :480-483
[8]  
HERMAN MA, 1988, SPRINGER SERIES MATE, V7, pCH1
[9]  
MAR HA, 1984, APPL PHYS LETT, V44, P899
[10]  
NISHIZAWA J, 1986, J VAC SCI TECHNOL A, V4, P706, DOI 10.1116/1.573838