STRENGTH ENHANCEMENT IN THIN-LAYERED AL-CU LAMINATES

被引:227
作者
LEHOCZKY, SL
机构
[1] McDonnell Douglas Research Laboratories, McDonnell Douglas Corporation, St. Louis
关键词
D O I
10.1063/1.324518
中图分类号
O59 [应用物理学];
学科分类号
摘要
Multilayered Al-Cu laminates were prepared by vapor deposition in vacuum onto NaCl substrates. The 25 °C stress-strain characteristics were measured for laminates having total thicknesses of 1.0 and 2.0 μm and layer thicknesses ranging from 20 to 1000 nm. For layer thicknesses ≲70 nm, the yield stress of the laminates is 4.2 times larger and the tensile fracture stress is 2.4-3.4 times larger than the values given by the rule of mixtures for Al and Cu. These strength increases are related to the basic physical properties of the metals and are in good agreement with Koehler's theoretical predictions.
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页码:5479 / 5485
页数:7
相关论文
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