PREPARATION OF CO FERRITE THIN-FILMS WITH LARGE PERPENDICULAR AND INPLANE COERCIVITIES BY FACING TARGETS SPUTTERING

被引:32
作者
MATSUSHITA, N
NAKAGAWA, S
NAOE, M
机构
[1] Dept. of Physical Electronics, Tokyo Institute of Technology 2-12-1 Ookayama, Meguro-ku Tokyo 152, JAPAN
关键词
6;
D O I
10.1109/20.179728
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Thin films with cobalt ferrite layer on ZnO underlayer were prepared at substrate temperature T(s) in range of 80-600-degrees-C by Facing Targets Sputtering apparatus. Crystallites in specimen films revealed almost perfect orientation of (111) plane even at T(s) as low as 80-degrees-C. Coercivity H(c) and saturation magnetization M(s) were strongly dependent on T(s). H(c) exhibited maximum and minimum values of 3300 and 400 Oe at T(s) or 300 and 600-degrees-C, respectively. M(s) increased with increase of T(s) and was 367 emu/cc at T(s) of 600-degrees-C. We conclude that these films should be applicable for magnetic recording disks with ultra-high density.
引用
收藏
页码:3108 / 3110
页数:3
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