ELECTRON-BEAM EXPOSURE SYSTEM AMDES

被引：8

作者：

SUGIYAMA, N

SAITOH, K

机构：

[1] Cooperative Laboratories, VLSI Technology Research Association, Takatsuku, Kawasaki, 213

来源：

COMPUTER-AIDED DESIGN | 1979年 / 11卷 / 02期

关键词：

D O I：

10.1016/0010-4485(79)90097-6

中图分类号：

TP31 [计算机软件];

学科分类号：

081202 ; 0835 ;

摘要：

A data processing system AMDES (automatic masking-data generation for electron-beam exposure system)1 has been developed to draw submicron patterns for integrated circuits. The purpose and functions of the AMDES software system are discussed. They include pattern-data manipulation techniques for multiple exposure elimination, polarity inversion, and design region partitioning. Characteristic features of these techniques are as follows: • Arbitrarily shaped patterns can be handled using arithmetic operations on polygon data with flexible chain-link data structures. • Statistical control of dynamic buffering enables data input and handling to be processed efficiently. © 1978.

引用

页码：59 / 65

页数：7