DIFFUSION IN AGAUPD THIN-FILM MICROCOUPLES

被引:18
作者
MURAKAMI, M [1 ]
DEFONTAI.D [1 ]
SANCHEZ, JM [1 ]
FODOR, J [1 ]
机构
[1] UNIV CALIF, SCH ENGN & APPL SCI, MAT DEPT, LOS ANGELES, CA 90024 USA
来源
ACTA METALLURGICA | 1974年 / 22卷 / 06期
关键词
D O I
10.1016/0001-6160(74)90080-7
中图分类号
TF [冶金工业];
学科分类号
0806 ;
摘要
引用
收藏
页码:709 / 719
页数:11
相关论文
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