MICROSTRUCTURAL CHARACTERIZATION OF NANOCOMPOSITE THIN-FILMS OF AG-SIO2, AG-ZNO AND AG-SI

被引：13

作者：

LEE, MH ^{[1
]}

CHANG, ITH ^{[1
]}

DOBSON, PJ ^{[1
]}

CANTOR, B ^{[1
]}

机构：

[1] UNIV OXFORD,OXFORD CTR ADV MAT & COMPOS,OXFORD OX1 3PH,ENGLAND

来源：

MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING | 1994年 / 179卷

关键词：

D O I：

10.1016/0921-5093(94)90264-X

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Cosputtering has been used to manufacture nanocomposite thin films of Ag particles embedded in amorphous SiO2, nanocrystalline ZnO and amorphous Si. A combination of X-ray diffractometry, high resolution and conventional transmission electron microscopy and electron probe microanalysis has been used to characterize the microstructures of the nanocomposite thin films. In cosputtered nanocomposite Ag-SiO2, Ag-ZnO and Ag-Si thin films the Ag particles are typically 5-25 nm in size.

引用

页码：545 / 551

页数：7