GIANT MAGNETORESISTANCE PEAKS IN CONICU/CU MULTILAYERS GROWN BY ELECTRODEPOSITION

被引:55
作者
HUA, SZ
LASHMORE, DS
SALAMANCARIBA, L
SCHWARZACHER, W
SWARTZENRUBER, LJ
MCMICHAEL, RD
BENNETT, LH
HART, R
机构
[1] NIST,GAITHERSBURG,MD 20899
[2] UNIV BRISTOL,DEPT PHYS,BRISTOL BS8 1TL,AVON,ENGLAND
关键词
D O I
10.1063/1.358250
中图分类号
O59 [应用物理学];
学科分类号
摘要
Giant magnetoresistance (GMR) of CoNiCu/Cu multilayers grown by electrodeposition was measured as a function of the copper layer thickness and effects of the order of 14% were obtained. The copper layer thickness ranged from 0.7 to 3.5 nm. Two peaks in the magnetoresistance were observed. One was centered at a copper thickness of ∼1.0 nm and the second was centered at ∼2.3 nm. Comparison of the field dependence of the magnetoresistance with the field dependence of the magnetization, as determined by vibrating-sample magnetometer, suggests that the saturation field for GMR and the magnetization are similar for the larger copper thicknesses, but are strikingly different near 1.0 nm copper thickness. This observation suggests that the GMR is affected by different factors depending on the thickness of the copper layer.
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收藏
页码:6519 / 6521
页数:3
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