INTERFACIAL RESISTIVE ANOMALY AT A NORMAL-SUPERCONDUCTING BOUNDARY

被引：45

作者：

KWONG, YK ^{[1
]}

LIN, K ^{[1
]}

HAKONEN, PJ ^{[1
]}

ISAACSON, MS ^{[1
]}

PARPIA, JM ^{[1
]}

机构：

[1] CORNELL UNIV,ATOM & SOLID STATE PHYS LAB,ITHACA,NY 14853

来源：

PHYSICAL REVIEW B | 1991年 / 44卷 / 01期

关键词：

D O I：

10.1103/PhysRevB.44.462

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We have observed an anomalous peak (approximately 5% of the normal-state resistance) in the resistive transition of a thin-film aluminum system consisting of regions of different, but comparable, transition temperatures. The peak occurs at slightly above the transition temperature of the lower T(c) section. The magnitude decreases with the distance of the voltage probes from the normal-superconducting (N-S) interface with a characteristic length scale of a few mu-m and is sensitive to a magnetic field. This anomaly appears to be consistent with a nearly constant superconducting potential near a N-S interface.

引用

页码：462 / 465

页数：4

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