OPTIMUM CONDITIONS IN THE ATTENUATED TOTAL REFLECTION TECHNIQUE

被引：11

作者：

KITAJIMA, H ^{[1
]}

HIEDA, K ^{[1
]}

SUEMATSU, Y ^{[1
]}

机构：

[1] KYUSHU INST TECHNOL,TOBATA KU,KITAKYUSHU 804,JAPAN

来源：

APPLIED OPTICS | 1981年 / 20卷 / 06期

关键词：

D O I：

10.1364/AO.20.001005

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

引用

页码：1005 / 1010

页数：6

共 20 条

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[9]

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