BORON-RICH B-SI ALLOYS .2. PREPARATION OF HOMOGENEOUS ALLOYS, ANALYSIS, CRYSTAL-GROWTH

被引：10

作者：

VIALA, JC

HILLEL, R

BOUIX, J

机构：

来源：

JOURNAL OF THE LESS-COMMON METALS | 1980年 / 71卷 / 02期

关键词：

D O I：

10.1016/0022-5088(80)90205-2

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：207 / 218

页数：12

共 15 条

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[2] FABRICATION AND STUDY OF ELECTRICAL-PROPERTIES OF BORON-SILICON COMPOUNDS WITH HIGH BORON CONCENTRATION [J].

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COMBESCURE, C ;

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LEPETRE, TP ;

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[5] MONO-CRYSTAL GROWTH OF BETA-RHOMBOHEDRAL BORON USING VERNEUIL-TYPE METHOD [J].

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VIALA, JC .

JOURNAL OF CRYSTAL GROWTH, 1978, 43 (02) :250-254

[6]

Cueilleron J., 1977, Boron and refractory borides, P203

[7] QUANTITATIVE GAS-CHROMATOGRAPHIC ANALYSIS OF BORON TRICHLORIDE, BORON AND BORON NITRIDE [J].

DILORENZ.A .

JOURNAL OF CHROMATOGRAPHY, 1973, 76 (01) :207-212

[8]

Elliot R.P, 1965, CONSTITUTION BINARY

[9]

HILLEL R, 1975, B SOC CHIM FR, V11, P2458

[10]

HILLEL R, 1978, 10TH MAT RES S NBS I

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