OXIDATION-KINETICS OF ZIRCONIUM CARBIDE AT RELATIVELY LOW-TEMPERATURES

被引：89

作者：

SHIMADA, S ^{[1
]}

ISHII, T ^{[1
]}

机构：

[1] TOMAKOMAI NATL COLL TECHNOL,TOMAKOMAI 059,JAPAN

来源：

JOURNAL OF THE AMERICAN CERAMIC SOCIETY | 1990年 / 73卷 / 10期

关键词：

diamonds; kinetics; mechanism; oxidation; zirconium;

D O I：

10.1111/j.1151-2916.1990.tb06678.x

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The isothermal oxidation of ZrC powders was carried out at relatively low temperatures of 380° to 550°C at oxygen pressures of 1.3, 2.6, and 7.9 kPa under a static total pressure of 39.5 kPa, achieved by mixing with argon, using an electromicrobalance. The oxidation kinetics are described by the diffusion‐controlled Jander's equation, following rapid oxidation in the early stage. Two activation energies were obtained: 138 kJ · mol−1 below about 470°C and 180 kJ · mol−1 above that temperature. The high‐ and low‐temperature oxidation mechanisms are discussed in connection with the crystallization of cubic ZrO2, accompanied by the generation of cracks, as well as the formation of carbon in the hexagonal diamond form in the product phase. Copyright © 1990, Wiley Blackwell. All rights reserved

引用

页码：2804 / 2808

页数：5

共 9 条

[1]

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[2]

BLUMENTHAL WB, 1958, CHEM BEHAVIOR ZIRCON, P46

[3]

CLARK JN, 1987, REV CHIM MINER, V24, P654

[4]

DUFOUR LC, 1967, CR ACAD SCI C CHIM, V265, P171