THERMAL-DECOMPOSITION OF ALKYL-HALIDES ON ALUMINUM .1. CARBON HALOGEN BOND-CLEAVAGE AND SURFACE BETA-HYDRIDE ELIMINATION-REACTIONS

被引：88

作者：

BENT, BE ^{[1
]}

NUZZO, RG ^{[1
]}

ZEGARSKI, BR ^{[1
]}

DUBOIS, LH ^{[1
]}

机构：

[1] AT&T BELL LABS,MURRAY HILL,NJ 07974

来源：

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY | 1991年 / 113卷 / 04期

关键词：

D O I：

10.1021/ja00004a012

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

The thermal decomposition of alkyl iodides adsorbed on Al(100) and Al(111) surfaces has been studied by using temperature-programmed desorption, integrated desorption mass spectrometry, and high-resolution electron energy loss spectroscopy. We find that alkyl iodides with three or more carbons adsorb dissociatively on aluminum at temperatures greater-than-or-similar to 130 K. The adsorbed alkyl ligands generated by C-I bond scission are stable on the surface up to approximately 450 K and are not significantly affected by the presence of the coadsorbed halogen atom. The dominant mechanism for thermal decomposition of the alkyl fragment is beta-hydride elimination, and the kinetics of this surface reaction are similar to those for beta-hydride elimination by aluminum alkyls in both the gas phase and solution.

引用

页码：1137 / 1142

页数：6

共 29 条

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ALBERT MR, 1987, SURFACE SCI GUIDE OR

[2]

[Anonymous], 1962, VACUUM

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