STUDY OF NB-BASED JOSEPHSON TUNNEL-JUNCTIONS

被引:21
作者
MATSUDA, A
INAMURA, T
YOSHIKIYO, H
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D O I
10.1063/1.328250
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O59 [应用物理学];
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页码:4310 / 4316
页数:7
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[1]   TUNNELING BETWEEN SUPERCONDUCTORS [J].
AMBEGAOKAR, V ;
BARATOFF, A .
PHYSICAL REVIEW LETTERS, 1963, 10 (11) :486-&
[2]   SIMPLE TECHNIQUE FOR DISPLAYING MAGNETIC FIELD DEPENDENCE OF DC JOSEPHSON EFFECT [J].
ARCHER, JW ;
MACFARLANE, JC .
JOURNAL OF PHYSICS E-SCIENTIFIC INSTRUMENTS, 1971, 4 (NDEC) :1074-+
[3]   CAPACITANCE AND ELLIPSOMETRICALLY DETERMINED OXIDE THICKNESS OF NB-OXIDE-PB JOSEPHSON TUNNEL-JUNCTIONS [J].
BASAVAIAH, S ;
GREINER, JH .
JOURNAL OF APPLIED PHYSICS, 1976, 47 (09) :4201-4202
[4]   SOME TEMPERATURE-DEPENDENT PROPERTIES OF NIOBIUM TUNNEL-JUNCTIONS [J].
BROOM, RF .
JOURNAL OF APPLIED PHYSICS, 1976, 47 (12) :5432-5439
[5]  
BROOM RF, 1975, 14 P INT C LOW TEMP, V4, P172
[6]   SUPERCURRENT DENSITY DISTRIBUTION IN JOSEPHSON JUNCTIONS [J].
DYNES, RC ;
FULTON, TA .
PHYSICAL REVIEW B, 1971, 3 (09) :3015-&
[7]   DC JOSEPHSON EFFECT FOR STRONG-COUPLING SUPERCONDUCTORS [J].
FULTON, TA ;
MCCUMBER, DE .
PHYSICAL REVIEW, 1968, 175 (02) :585-&
[8]  
GILABERT A, 1979, SOLID STATE COMMUN, V31, P109, DOI 10.1016/0038-1098(79)90178-9
[9]   MASKING OF DEPOSITED THIN-FILMS BY MEANS OF AN ALUMINUM-PHOTORESIST COMPOSITE [J].
GREBE, K ;
AMES, I ;
GINZBERG, A .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (01) :458-460
[10]   JOSEPHSON TUNNELING BARRIERS BY RF SPUTTER ETCHING IN AN OXYGEN PLASMA [J].
GREINER, HJ .
JOURNAL OF APPLIED PHYSICS, 1971, 42 (12) :5151-&