HIGH-CURRENT FIB SYSTEM FOR MICROMECHANICS APPLICATION

被引：8

作者：

BISCHOFF, L

HESSE, E

HOFMANN, G

NAEHRING, FK

PROBST, W

SCHMIDT, B

TEICHERT, J

机构：

[1] Research Center Rossendorf Inc. Institute for Ion Beam Physics and Material Research PF 19, 8051 Dresden, DO

来源：

MICROELECTRONIC ENGINEERING | 1993年 / 21卷 / 1-4期

关键词：

Gallium; -; Micromachining;

D O I：

10.1016/0167-9317(93)90054-9

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A high current Focused Ion Beam (FIB) system, designed to achieve current densities above 10 A/cm2 is presented. The system parameters and properties are discussed and first applications in the field of micromechanics are shown.

引用

页码：197 / 200

页数：4