ABSOLUTE DOSIMETRY OF ION-IMPLANTED IMPURITIES USING A CALORIMETRIC METHOD

被引：4

作者：

HEMMENT, PLF ^{[1
]}

机构：

[1] UNIV SURREY,DEPT ELECTR & ELECT ENGN,GUILDFORD GU2 5XH,SURREY,ENGLAND

来源：

关键词：

D O I：

10.1016/S0042-207X(77)80443-0

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：611 / 616

页数：6

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ANDERSEN, HH ;

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[5]

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[6]

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[7]

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[8]

HAINING RW, TO BE PUBLISHED

[9]

HEMMENT PLF, 1975, U SURREY INTERNAL RE

[10]

JORGENSEN T, 1965, PHYS REV, V140, P1481