CHARACTERISTICS OF A MONODISPERSE PHS-BASED POSITIVE RESIST (MDPR) IN KRF EXCIMER LASER LITHOGRAPHY

A new chemically amplified monodisperse PHS-based positive resist (MDPR) has been developed for KrF excimer laser lithography. MDPR is an alkali-developable single-layer resist, composed of partially tBOC-protected PHS, a dissolution inhibitor and a photoacid generator. We used nearly monodisperse PHS synthesized by living polymerization and obtained fine patterning. The MDPR has a high contrast value gamma of 4, which results in excellent resolution: the MDPR can easily generate 1 & s patterns down to 0.25 mum in width at 90 Mj/CM2 . A higher sensitivity of 45 Mj/CM2 and a contrast value gamma of 12 were achieved with a blended MDPR.