INFLUENCE OF OH-CONCENTRATION AND IRRADIATION ON LOW-TEMPERATURE DIELECTRIC LOSS IN SILICA GLASS

被引：10

作者：

JAEGER, RE

机构：

来源：

JOURNAL OF THE AMERICAN CERAMIC SOCIETY | 1968年 / 51卷 / 01期

关键词：

D O I：

10.1111/j.1151-2916.1968.tb11832.x

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

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页码：57 / &

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