SMALL-ANGLE X-RAY AND NEUTRON-SCATTERING STUDIES OF PLASMA-DEPOSITED AMORPHOUS SILICON-HYDROGEN FILMS

被引：44

作者：

LEADBETTER, AJ

RASHID, AAM

RICHARDSON, RM

WRIGHT, AF

KNIGHTS, JC

机构：

[1] RUTHERFORD HIGH ENERGY LAB,CHILTON OX11 0QX,OXFORDSHIRE,ENGLAND

[2] XEROX CORP,PALO ALTO RES CTR,PALO ALTO,CA 94304

[3] ILL GRENOBLE,F-38042 GRENOBLE,FRANCE

来源：

SOLID STATE COMMUNICATIONS | 1980年 / 33卷 / 09期

关键词：

D O I：

10.1016/0038-1098(80)90293-8

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

引用

收藏

页码：973 / 977

页数：5

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