ION-BEAM-ASSISTED DEPOSITION OF NI/C MULTILAYER X-RAY MIRRORS

被引：18

作者：

PUIK, EJ ^{[1
]}

VANDERWIEL, MJ ^{[1
]}

VERHOEVEN, J ^{[1
]}

ZEIJLEMAKER, H ^{[1
]}

机构：

[1] FOM,INST ATOM & MOLEC PHYS,1098 SJ AMSTERDAM,NETHERLANDS

来源：

THIN SOLID FILMS | 1990年 / 193卷 / 1-2期

关键词：

D O I：

10.1016/0040-6090(90)90231-2

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The reflectivity and the energy resolution of multilayer X-ray mirrors depend on the interface roughness created during deposition of the layers. We have investigated the influence of argon ion impact during and after deposition by evaporation of nickel on the interface roughness of an Ni/C multilayer. Roughness changes have been monitored by X-ray reflection. Etching of one and a half periods of nickel by argon ions of energy 200eV has turned out to improve the reflectivity of one interface by a factor of 3.

引用

页码：782 / 787

页数：6

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