COMPUTER-CONTROLLED RESIST EXPOSURE IN SCANNING ELECTRON-MICROSCOPE

被引：28

作者：

HERZOG, RF

VANDUZER, T

GREENEIC.JS

EVERHART, TE

机构：

来源：

IEEE TRANSACTIONS ON ELECTRON DEVICES | 1972年 / ED19卷 / 05期

关键词：

D O I：

10.1109/T-ED.1972.17465

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：635 / &

共 20 条

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