MICROWAVE PLASMA CVD SYSTEM FOR THE FABRICATION OF THIN SOLID FILMS

被引:18
作者
KATO, I [1 ]
WAKANA, S [1 ]
HARA, S [1 ]
KEZUKA, H [1 ]
机构
[1] HOSEI UNIV,COLL ENGN,TOKYO 184,JAPAN
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1982年 / 21卷 / 08期
关键词
D O I
10.1143/JJAP.21.L470
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:L470 / L472
页数:3
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    [J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1965, 36 (03) : 294 - +
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    KATO, I
    TSUCHIDA, H
    NAGAI, M
    [J]. JOURNAL OF APPLIED PHYSICS, 1980, 51 (10) : 5312 - 5315