ELECTRICAL AND STRUCTURAL PROPERTIES OF CO-SPUTTERED TANTALUM-ALUMINUM FILMS

[1] BLATT FJ, 1968, PHYSICS ELECT CONDUC, P220

[2] ELLIOTT RP, 1965, CONSTITUTION BINARY, P56

[3] KRAUTY E, 1963, Z ANGEW PHYSIK, V15, P2

[4] METASTABLE EVAPORATED THIN FILMS OF CU-AG AND CO-AU ALLOYS .2. KINETICS OF TRANSFORMATIONS [J]. ACTA METALLURGICA, 1967, 15 (02): : 215 - +

[5] METASTABLE EVAPORATED THIN FILMS OF CU-AG AND CO-AU ALLOYS .I. OCCURRENCE AND MORPHOLOGY OF PHASES [J]. ACTA METALLURGICA, 1967, 15 (02): : 203 - +

[6] A HARD-SPHERE MODEL TO SIMULATE ALLOY THIN FILMS [J]. IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1965, 9 (5-6) : 358 - &

[7] Raman A., 1965, ALUMINIUM, V41, P318

[8] A NEW STRUCTURE IN TANTALUM THIN FILMS (VAPOR DEPOSITION SUPERCONDUCTIVITY SPUTTERING X-RAY DIFFRACTION E) [J]. APPLIED PHYSICS LETTERS, 1965, 7 (03) : 51 - &

[9] SAMSONOV GV, 1965, IZV AKAD NAUK SSR NM, V1, P1071

[10] SINELNIKOVA VS, 1964, IZV AKAD NAUK SS MGD, V1, P121

[1] BLATT FJ, 1968, PHYSICS ELECT CONDUC, P220

[2] ELLIOTT RP, 1965, CONSTITUTION BINARY, P56

[3] KRAUTY E, 1963, Z ANGEW PHYSIK, V15, P2

[4] METASTABLE EVAPORATED THIN FILMS OF CU-AG AND CO-AU ALLOYS .2. KINETICS OF TRANSFORMATIONS [J]. ACTA METALLURGICA, 1967, 15 (02): : 215 - +

[5] METASTABLE EVAPORATED THIN FILMS OF CU-AG AND CO-AU ALLOYS .I. OCCURRENCE AND MORPHOLOGY OF PHASES [J]. ACTA METALLURGICA, 1967, 15 (02): : 203 - +

[6] A HARD-SPHERE MODEL TO SIMULATE ALLOY THIN FILMS [J]. IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1965, 9 (5-6) : 358 - &

[7] Raman A., 1965, ALUMINIUM, V41, P318

[8] A NEW STRUCTURE IN TANTALUM THIN FILMS (VAPOR DEPOSITION SUPERCONDUCTIVITY SPUTTERING X-RAY DIFFRACTION E) [J]. APPLIED PHYSICS LETTERS, 1965, 7 (03) : 51 - &

[9] SAMSONOV GV, 1965, IZV AKAD NAUK SSR NM, V1, P1071

[10] SINELNIKOVA VS, 1964, IZV AKAD NAUK SS MGD, V1, P121