CONTROLLED UNIFORM GROWTH OF GAINASP-INP STRUCTURES FOR LASER APPLICATION ON 2 INCH WAFERS BY LP-MOVPE AT 20 MBAR

被引:9
作者
MEYER, R
GRUTZMACHER, D
JURGENSEN, H
BALK, P
机构
[1] RWTH, Germany
关键词
D O I
10.1016/0022-0248(88)90541-6
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
19
引用
收藏
页码:285 / 291
页数:7
相关论文
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