HYDROXYL RADICAL ADDUCT AT SULFUR IN SUBSTITUTED ORGANIC SULFIDES STABILIZED BY INTERNAL HYDROGEN-BOND

被引：55

作者：

BOBROWSKI, K ^{[1
]}

SCHONEICH, C ^{[1
]}

机构：

[1] UNIV KANSAS, DEPT PHARMACEUT CHEM, LAWRENCE, KS 66045 USA

来源：

JOURNAL OF THE CHEMICAL SOCIETY-CHEMICAL COMMUNICATIONS | 1993年 / 09期

关键词：

D O I：

10.1039/c39930000795

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

The stability of an OH radical adduct at sulfur atoms in substituted organic sulfides is greatly enhanced by the formation of an internal hydrogen bond between the hydroxyl hydrogen and an oxygen located either in an adjacent carbonyl or methoxy group; the first absolute rate constants of the reactions of such adducts with molecular oxygen are reported.

引用

页码：795 / 797

页数：3

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