THE SI-C BOND DISTANCE IN SI(CH3)4

被引：40

作者：

SHEEHAN, WF

SCHOMAKER, V

机构：

来源：

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY | 1952年 / 74卷 / 15期

关键词：

D O I：

10.1021/ja01135a522

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

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页码：3956 / 3956

页数：1

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