IMPROVEMENTS IN PHOTOMULTIPLIERS WITH TOTAL INTERNAL REFLECTION SENSITIVITY ENHANCEMENT

被引：14

作者：

HIRSCHFELD, T

机构：

来源：

APPLIED OPTICS | 1968年 / 7卷 / 03期

关键词：

D O I：

10.1364/AO.7.000443

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

引用

页码：443 / +

页数：1

共 24 条

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[8]

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[9] EFFECTIVE THICKNESS OF BULK MATERIALS AND OF THIN FILMS FOR INTERNAL REFLECTION SPECTROSCOPY [J].

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[10] ELECTRIC FIELD STRENGTHS AT TOTALLY REFLECTING INTERFACES [J].

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