KINETICS OF OXIDE FILM GROWTH ON METAL CRYSTALS - THERMAL ELECTRON EMISSION AND IONIC DIFFUSION

被引：108

作者：

FROMHOLD, AT

COOK, EL

机构：

来源：

PHYSICAL REVIEW | 1967年 / 163卷 / 03期

关键词：

D O I：

10.1103/PhysRev.163.650

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

引用

收藏

页码：650 / &

相关论文

共 43 条

[1] THEORY OF FORMATION OF VERY THIN OXIDE FILMS ON METALS
BOGGIO, JE
PLUMB, RC
[J]. JOURNAL OF CHEMICAL PHYSICS, 1966, 44 (03) : 1081 - &
[2] AN ELECTROCHEMICAL MODEL FOR OXIDATION OF ZIRCONIUM
BRADHURS.DH
DRALEY, JE
VANDRUNE.CJ
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1965, 112 (12) : 1171 - +
[3] PHOTOEMISSIVE DETERMINATION OF BARRIER SHAPE IN TUNNEL JUNCTIONS
BRAUNSTE.A
BRAUNSTE.M
PICUS, GS
MEAD, CA
[J]. PHYSICAL REVIEW LETTERS, 1965, 14 (07) : 219 - &
[4] Cabrera N., 1949, REP PROG PHYS, V12, P308
[5] KINETICS AND MECHANISM OF OXIDATION OF SUPERPURITY ALUMINUM IN DRY OXYGEN .I. APPARATUS DESCRIPTION AND GROWTH OF AMORPHOUS OXIDE
DIGNAM, MJ
FAWCETT, WR
BOHNI, H
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1966, 113 (07) : 656 - +
[6] FIELD DEPENDENCE + ANOMALOUS TEMPERATURE DEPENDENCE OF TAFEL SLOPES FOR PROCESSES OCCURRING AT HIGH ELECTROSTATIC FIELDS
DIGNAM, MJ
[J]. CANADIAN JOURNAL OF CHEMISTRY-REVUE CANADIENNE DE CHIMIE, 1964, 42 (05): : 1155 - &
[7] OXIDE FILMS ON ALUMINUM .2. KINETICS OF FORMATION IN OXYGEN
DIGNAM, MJ
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1962, 109 (03) : 192 - 198
[8] SCHOTTKY EMISSION THROUGH THIN INSULATING FILMS
EMTAGE, PR
TANTRAPORN, W
[J]. PHYSICAL REVIEW LETTERS, 1962, 8 (07) : 267 - &
[9] PARABOLIC GROWTH LAW FOR COHERENT OXIDES
FROMHOLD, AT
[J]. JOURNAL OF CHEMICAL PHYSICS, 1964, 41 (02) : 509 - &
[10] STRUCTURE MODEL FOR LOW-TEMPERATURE THERMAL OXIDATION KINETICS
FROMHOLD, AT
[J]. JOURNAL OF APPLIED PHYSICS, 1965, 36 (3P1) : 865 - +

← 1 2 3 4 5 →